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Reduction of junction leakage current and sheet resistance using C-49 TiSi_2 as a diffusion source
Reduction of junction leakage current and sheet resistance using C-49 TiSi_2 as a diffusion source
1998
Dong Kyun Sohn
Ji-Soo Park
Byung Hak Lee
Jin Won Park
Jeong Soo Byun
Jac Jeong Kim
Keywords:
Machine learning
Artificial intelligence
Computer science
Leakage (electronics)
Sheet resistance
Electronic engineering
junction leakage
shallow junction
Optoelectronics
Pattern recognition
Correction
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