3d flash memory production method

The present invention provides a method for producing a 3D flash memory, by depositing several layers of a first dielectric layer, a second dielectric layer and the third set of dielectric thin films, and etching of the third dielectric layer process to form the word line self-aligned the through-hole connection, without going through the stepped through hole is formed the word line lead-out connection, reducing the number of layers used in a mask, reduce production costs, in addition to the third layer by deposition and etching medium to adjust its thickness, thereby adjusting the size of the CD between the word line and the word line RC delay and noise control between the word line and the word line.