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Investigation of TaN as the wet etch stop layer for HKMG-last integration in the 22 nm and beyond nodes CMOS technology
Investigation of TaN as the wet etch stop layer for HKMG-last integration in the 22 nm and beyond nodes CMOS technology
2015
cuihushan
Jun Luo
Jing Xu
Jianfeng Gao
Jinjuan Xiang
tangzhaoyun
Xiaolei Wang
Yihong Lu
Xiaobin He
Tingting Li
Bo Tang
Jiahan Yu
Tao Yang
Yan Jiang
Junfeng Li
Chao Zhao
Tianchun Ye
Keywords:
Electronic engineering
CMOS
Materials science
Optoelectronics
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