Transient voltage suppressor (TVS) with reduced breakdown voltage

A low capacitance transient voltage suppressor with snapback control and a reduced voltage punch-through breakdown mode includes an n+ type substrate, a first epitaxial layer on the substrate, a buried layer formed within the first epitaxial layer, a second epitaxial layer on the first epitaxial layer, and an implant layer formed within the first epitaxial layer below the buried layer. The implant layer extends beyond the buried layer. A first trench is at an edge of the buried layer and an edge of the implant layer. A second trench is at another edge of the buried layer and extends into the implant layer. A third trench is at another edge of the implant layer. A set of source regions is formed within a top surface of the second epitaxial layer. Implant regions are formed in the second epitaxial layer, with a first implant region located below the first source region.