REACTIVITY OF Cr(CO) 6 IN ATMOSPHERIC PRESSURE CVD PROCESSES FOR THE GROWTH OF VARIOUS METALLURGICAL COATINGS

Metalorganic precursors allow a significant decrease of the deposition temperature in CVD processes. When they are employed under atmospheric pressure and using direct liquid injection delivery systems, new processes can be developed for the growth of metallurgical coat- ings. However, even for a single precursor the great variety of reactive gas phase leads to various coatings with different properties. Original nanocrystalline CrC x O y and CrN x O y films were depos- ited in a laminar flow reactor by MOCVD and DLICVD using Cr(CO) 6 as molecular precursor in the temperature range 285-450 °C. Pyrolysis was carried out in different ambient including N 2 , H 2 , NH 3 , THF, and toluene. The influence of the various atmosphere on the composition, structure and, consequently, mechanical properties and corrosion behavior of these coatings is discussed.