language-icon Old Web
English
Sign In
Acemap > Paper > プラズマ原子層堆積法で300°C低温形成した強誘電体Hf x Zr 1-x O 2 薄膜の疲労特性

プラズマ原子層堆積法で300°C低温形成した強誘電体Hf x Zr 1-x O 2 薄膜の疲労特性

2020 
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    0
    References
    0
    Citations
    NaN
    KQI
    []
    logo
    • CCF Conference Analysis
    • Map Galaxy
    • What's New
    © Copyright 2015-2020 Acemap, Inc. Shanghai Jiao Tong University.