Crystalline vanadium nitride ultra-thin films obtained at room temperature by pulsed laser deposition

Abstract In this work the synthesis of vanadium nitride ultra-thin films by means of pulsed laser deposition technique is reported. The solid target used for laser ablation was prepared from vanadium nitride powder synthesised by sol–gel of V 2 O 5 followed by temperature programmed reduction with ammonia. The films deposition was performed at room temperature and 500 °C on glass or Si substrates and the films were characterised by different techniques, i.e., Scanning and Transmission Electron Microscopy, X-Ray Diffraction, Atomic Force Microscopy and X-ray Photoelectron Spectroscopy. As a function of the deposition conditions, the films present different thicknesses, reveal a homogenous dense to slightly porous morphology and are highly crystalline. As determined by X-ray Photoelectron Spectroscopy analyses the VN films are nitrogen deficient due to the formation of an oxide layer on their surface. The possibility of depositing crystalline VN ultra-thin films at room temperature using a VN target is of great importance for several possible applications where low temperature substrates are employed.