Method for processing microstructure on highly oriented pyrolytic graphite by using photolithography technique

The invention discloses a method for processing a microstructure on highly oriented pyrolytic graphite by using a photolithography technique. The method comprises the following steps: 1, leveling the surface, namely grinding a highly oriented pyrolytic graphite (HOPG) surface by using a grinding machine, and polishing the surface; 2, cleaning the surface; 3, manufacturing a mask of the HOPG; 4, spinning a photoresist to serve as a mask of a SiO2 film or a metal film; 5, photoetching; 6, patterning the HOPG mask; 7, etching the HOPG; 8, removing the photoresist; and 9, removing the HOPG film. The method has the effective effects that the HOPG is directly processed by means of the common photoetching method for micro-electronics and micro-electromechanical systems (MEMS), and the method is mature in process production line, high in cost performance and suitable for directly processing patterns with the characteristic scale of more than 500nm on the HOPG.