Development of p-i-n Radiation Detectors based on Semi-Insulating 4H-SiC Substrate via Dual-face ion implantation

Abstract To explore the potential of semi-insulating (SI) SiC substrate for radiation detector applications, p-i-n diodes with thick depletion layers are fabricated by using a dual-face ion implantation technique on SI 4H-SiC substrate. The Poole-Frenkel (P-F) emission is found responsible for the reverse leakage current transport of the p-i-n diode at elevated temperatures. The derived emission barrier height is likely induced by the residual boron-related shallow-level states, which are located ∼0.3 eV above the top of the valence band. Detection tests of α-particles are performed on each side of the p-i-n detector to determine the location of the depleted region, which reveals weak p-type conduction of the SI 4H-SiC substrate after high temperature post-implantation annealing. The energy resolution of the detector operating in photovoltaic mode is ∼4.3%, which would degrade at higher biases. The saturated charge collection efficiency (CCE) of ∼99% for detection of 5.48 MeV α-particles is obtained as reverse bias exceeds 80 V.