Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon

The dual-frequency capacitively coupled plasma (DF-CCP) with inductive enhancement system is a newly designed plasma reactor. Different from the conventional inductively coupled plasma (ICP) reactors, now a radio frequency (rf) power is connected to an antenna placed outside the chamber with a one-turn bare coil placed between two electrodes in DF-CCP. This paper gives a detailed description of its structure. Moreover, investigations on some characteristics of discharges in this apparatus were made via a Langmuir probe.