X-Ray Photoelectron Spectroscopic Studies of Electrode Surfaces.

1980 
Abstract : Emphasis is on the development of x-ray photoelectron spectroscopy (XPS) in characterizing electrochemical reaction mechanisms. The advantages of XPS to the study of electrode surfaces are the depth sensitivity to most metals is quite high with the escape length of the emitted electrons occurring only through 10-20A of the sample surface. The measured binding energies are sensitive to the oxidation state of the metal atom. Under potential deposition for silver and copper on platinum electrodes have been examined by both XPS and Auger spectroscopy. A combination of XPS and secondary ion mass spectrometry (SIMS) was designed and connected with two satellite vacuum systems via a set of magnetically driven transfer device. This configuration allowed each technique to have its own chamber for electrode preparation. High energy ion beams were investigated for use in the ion implantation of various substrates aimed at creating new materials with unusual properties. Initial studies were focused on use of copper, silver, and gold ion beams directed toward silicon dioxide and graphite. (Author)
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