Effect of substrate temperature on the structural, electrical and optical properties of ITO films prepared by RF magnetron sputtering

Polycrystalline indium tin oxide (ITO) thin films were prepared on glass substrates using rf magnetron sputtering from ITO target. The as-deposited films were studied as a function of substrate temperature Ts using X-ray diffraction (XRD), electrical and optical measurements. In the range 150 °C ≤ Ts ≤ 250 °C, XRD shows the coexistence of the 〈100〉 and 〈111〉 textures. The results of electrical and structural measurements suggest that the donor impurities are due to the substitution of Sn into In sites, which causes an expansion of the lattice. The resistivity was found to decrease with Ts up to 250 °C. The quality of the films as transparent conducting layers, for solar cell applications, was investigated.