Manufacturing of four-quadrant phase mask for nulling interferometry in the thermal infrared
2004
The Four Quadrant Phase Mask is a key component for the design of advanced coronagraphs that may be used to search exo-planets. The validity of this concept has been demonstrated in the visible and need now to be demonstrated in the mid infrared. For this purpose, two components are manufactured for wavelengths 4.75 and 16.25 μm. This manufacturing requires the deposition of ZnSe layers using Ion Assisted Deposition, followed by a lift off process.
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