Local wet etching of glasses by acidification utilizing electrochemistry

A new local wet etching method for microstructuring glass substrates without using photolithographic masking is presented. By utilizing local acidification of fluoride solution by electrochemical water oxidation reaction on micrometer-sized Pt electrodes, fine grooves were formed in silicate glass substrates. The groove formation speed was increased with increase in potential applied to the Pt electrode and was dependent on the glass type (silica, borosilicate or soda-lime).