One kind of layout design method for detecting a photolithography process friendliness

One kind of a photolithography process friendliness layout detection method of the present invention, the original target pattern by previously filtered data, the process determines the potential hot spot area, and the potential hot spots pattern data conversion process is a lithographic target pattern data, and then the lithographic target pattern data to simplify the optical proximity correction pattern and performs preliminary investigation process simulation hotspots and hotspot to process graphics data at the beginning position and the check mark edge positions necessary for accurate and complete based optical proximity correction and graphic simulation process to check the final hot spots, in order to pinpoint the premise of the hot process, reducing the time and computing software used throughout the process, reducing production cost, improve production efficiency.