Display panel manufacturing method

The present invention provides a method for manufacturing a display panel, comprising the steps of: forming a gate on the gate insulating layer covering the substrate and the gate electrode, a semiconductor layer and an etching stopper layer. By two opposite sides of the substrate photolithography a photoresist pattern is formed on the etching stopper layer, etching using a photoresist pattern as an etching stopper layer is dry etching blocking pattern. Again forming a photoresist pattern on the etch barrier pattern by photolithography two opposing side of the substrate, the semiconductor layer using the photoresist pattern as a wet etching semiconductor pattern. Portion covering the source and drain etch barrier pattern, a semiconductor pattern and the gate insulating layer is formed on both sides are symmetrical about the gate.