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Influence of Halogen plasma Atmosphere on SiO_2 Etching Characteristics : Etching
Influence of Halogen plasma Atmosphere on SiO_2 Etching Characteristics : Etching
1992
Ken Tokashiki
Eiji Ikawa
Toshiki Hashimoto
Takamaro Kikkawa
Yuden Teraoka
Iwao Nishiyama
Keywords:
Electronegativity
Atmosphere
Plasma
Dry etching
Reactive-ion etching
Halogen
Etching (microfabrication)
Etching
Inorganic chemistry
Chemistry
Selectivity
Correction
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