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Effects of CF4 Surface Etching on 4H-SiC MOS Capacitors
Effects of CF4 Surface Etching on 4H-SiC MOS Capacitors
2018
Kiichi Kobayakawa
Kosuke Muraoka
Hiroshi Sezaki
Seiji Ishikawa
Tomonori Maeda
Shin-Ichiro Kuroki
Keywords:
Metallurgy
Composite material
Dry etching
Capacitor
Materials science
Etching
Fluorine
surface etching
mos capacitor
Correction
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