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Study of residual gas suppression for etching rate stabilization in the dry etching
Study of residual gas suppression for etching rate stabilization in the dry etching
2017
Yukihiro Tsuji
Tetsuya Hattori
Masaki Yanagisawa
Hajime Shoji
Keywords:
Dry etching
Residual
Etching (microfabrication)
Reactive-ion etching
Etching
Mass spectrometry
Semiconductor
Chemistry
Analytical chemistry
etching rate
Correction
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