Photoreflectance and photoluminescence study of localization effects in GaAsBi alloys

Abstract Photoreflectance (PR) and photoluminescence (PL) spectra of GaAs 1− x Bi x alloys grown by metalorganic vapor phase epitaxy, for x up to 4.8%, were measured at temperatures ranging from 12 to 300 K. The PR signal shifts due to the temperature change decreases with increasing Bi content of GaAsBi alloys. For temperature below 100 K, a dominant peak in PL spectra of GaAsBi was observed. This peak is attributed to carrier localization resulting from Bi-related localized states in GaAsBi. A decrease in PR signal has been also found when the temperature was lowered. This behavior is attributed to a weakening of modulation efficiency, which is induced by carrier localization that has been evidenced in low temperature PL. The localized state emission partly contributes to the decrease in the band gap energy shift. In addition, at high temperatures the small PR signal shift is due to the reduction in the temperature dependence of the band gap energy. The analysis of the band gap energy evolution with temperature using the Bose–Einstein statistical expression shows that the average phonon energy is much larger than that expected from the linear interpolation between GaAs and GaBi. This fact is related to the interaction between electrons and phonons localized at Bi atoms playing an important role in the reduction of the temperature dependence of the band gap energy of GaAsBi alloys.