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Nitrogen profile engineering in the interfacial SiON for HfAlOx gate dielectric
Nitrogen profile engineering in the interfacial SiON for HfAlOx gate dielectric
2004
Riichiro Mitsuhashi
Kazuyoshi Torii
Hiroshi Ohji
Takaaki Kawahara
Atsushi Horiuchi
Hitoshi Takada
Masashi Takahashi
Hiroshi Kitajima
Keywords:
Gate dielectric
Nitrogen
Analytical chemistry
Materials science
Optoelectronics
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