Binary-Phase Fourier Gratings for Nonuniform Array Generation

We describe a design method for a binary-phase Fourier grating that generates an array of spots with nonuniform, user-defined intensities symmetric about the zeroth order. Like the Dammann fanout grating approach, the binary-phase Fourier grating uses only two phase levels in its grating surface profile to generate the final spot array. Unlike the Dammann fanout grating approach, this method allows for the generation of nonuniform, user-defined intensities within the final fanout pattern. Restrictions governing the specification and realization of the array's individual spot intensities are discussed. Design methods used to realize the grating employ both simulated annealing and nonlinear optimization approaches to locate optimal solutions to the grating design problem. The end-use application driving this development operates in the near- to mid-infrared spectrum - allowing for higher resolution in grating specification and fabrication with respect to wavelength than may be available in visible spectrum applications. Fabrication of a grating generating a user-defined nine spot pattern is accomplished in GaAs for the near-infrared. Characterization of the grating is provided through the measurement of individual spot intensities, array uniformity, and overall efficiency. Final measurements are compared to calculated values with a discussion of the results.