Thirty-eight-centimeter ion source

Abstract The 38-cm ion source was developed for large capacity production applications. The ion-beam current of this source is the largest presently available from a single source at ion-etching energies. The performance of the 38-cm ion source is described, together with its etching and deposition applications. Also included is a description of the development program for the ion source and its controller, along with the objectives and major considerations of this development program.