Method and apparatus for processing substrates

Devices and methods adapted to polish the edge of the substrate, a polishing film, by applying a tension and load on the polishing film, a frame is adapted at least a portion of the membrane so as to support in a plane, polishing polished by rotating the substrate relative to the plane of the film, the polishing film is imparted a force to the substrate, aligned contour the edge of the substrate including at least an outer edge and first inclined surface, further, the outer edge and first inclined surface when the substrate is rotated and a, a substrate rotation driving device is adapted to. Numerous other aspects are provided. .FIELD 5