Rapid prototyping and structure generation using three-dimensional nanolithography with electron-beam-induced chemical reactions

Micromechanical devices and systems sometimes require a nanostructured addition or subtraction of material to obtain a more specific functionality. Silicon micro-technology is able to generate smart devices, but is facing a very complex processing to generate nano-structured areas to specialize the device, which are required only in small numbers. Here the very high resolution technique of three-dimensional electron beam nanolithography with chemically induced reactions can help. This technique is performed as a bottom up direct write or etch technique using a dedicated electron beam system with beam control and the possibility to add on chemicals using molecular beams, which can be switched on and off, and with a concentration matching the chemicals required to the lithography action. Etching oxides and carbides allows to structure very hard materials. Depositing oxides, metal or metal carbon compounds allows to add on specific three-dimensional nano-structures. Surfaces can potentially be modified to become specially chemically active or protected, and electronic circuitry can potentially be added in situ, which are built using vacuum micro-electronic devices to amplify or switch signals. This leads to novel nanoanalytical devices and many applications. The technology is described. Applications are presented, e.g. in nano-optics with the rapid prototyping of photonic crystals, in nano-electronics with a micro-triode, and in nano biotechnology with surface structures. A comparison of electron-, ion- and laser-beam induced reactions is given.