Improvement of line edge roughness by employing new PAG

Yang-Sook Kim,Yun-Hyi Kim,Sang Hyang Lee,Yun-Gill Yim,Deog-Bae Kim,Jae Hyun Kim

Improvement of line edge roughness by employing new PAG

2002

Yang-Sook Kim
Yun-Hyi Kim
Sang Hyang Lee
Yun-Gill Yim
Deog-Bae Kim
Jae Hyun Kim

Novel organic PAGs have been prepared in order to improve line edge roughness (LER) of 248nm and 193nm resists. From careful design of PAG, transparent, highly diffusive PAG was successfully prepared. New PAGs have increased hydrophilicity in cationic portion of PAG(photoacid generator.).

Keywords:

Onium compound
Cationic polymerization
Electronic engineering
Resist
Surface finish
Photoacid
Materials science
Inorganic chemistry
Optics
Optoelectronics
line edge roughness
photoacid generator

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