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Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol‐ene Click Chemistry
Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol‐ene Click Chemistry
2008
Luis M. Campos
Ines Meinel
Rosette G. Guino
Martin Schierhorn
Nalini Gupta
Galen D. Stucky
Craig J. Hawker
Keywords:
Self-healing hydrogels
Nanotechnology
Thiol
Click chemistry
Lithography
Materials science
Ene reaction
Polymer chemistry
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