Gate dielectric ion implantation to modulate the threshold voltage of In2O3 nanowire field effect transistors

In semiconductor technology, In2O3 nanowire field effect transistor (FET) can serve as an important building block due to its admirable electrical switching properties. However, the relatively too large threshold voltages and threshold voltage fluctuations of the devices may hinder their extensive applications. In this report, N+ ion implantation of gate dielectric was conducted to modulate the threshold voltage of In2O3 nanowire FET. Electrical measurements reveal that the threshold voltage can be reduced to as low as −2.0 V from the initial −23.2 V after ion implantation. This can be attributed to the effects of implantation induced electron traps. Moreover, it is found that the stability of threshold voltage can be improved by ion implantation. This simple and convenient method indicates that gate dielectric ion implantation may be a potential way to realize the low voltage operation and uniform In2O3 nanowire FETs.