Growth of β-FeSi2 on MnSi1.7 layers by reactive deposition epitaxy

Abstract The growth of ternary silicides and β-FeSi 2 on ternary silicides for pseudobinary system MnSi 1.7 –β-FeSi 2 was investigated by reactive deposition epitaxy (RDE). The structural properties of resultant silicide layers were examined by X-ray diffraction (XRD) and transmission electron microscopy (TEM). It was found that a Fe x Mn 1− x Si 1.7 layer having a Mn 11 Si 19 crystalline structure was formed when Fe was deposited within limited solubility range in MnSi 1.7 . On the other hand, β-FeSi 2 islands were grown on Fe x Mn 1− x Si 1.7 layers when excess Fe atoms were deposited. The growth evolution and phase transitions of the silicide layers are discussed.