The deposition source, the vapor deposition apparatus, a film forming method of the organic thin film

Good organic thin film quality to provide a film-formable deposition apparatus. Deposition apparatus 1 of the present invention has a the evaporation chamber 15 and the vapor deposition case 21, the vapor deposition case 21 and the evaporating chamber 15 is connected to a small hole 38. Since the vapor deposition material 16 is fed by the amount required to the evaporation chamber 15, is not a large amount of the vapor deposition material 16 is heated for a long time. Since the vapor deposition material 16 is evaporated in the evaporation chamber 15, even if occurred bumping, droplets does not reach the substrate 6. If caused to evaporate the vapor deposition material 16 in the irradiation of the laser beam requires less chemical modification of the vapor deposition material 16.