PULSED LASER DEPOSITION OF EXPLOSION BORON NITRIDE AT AMBIENT TEMPERATURE

In this study,explosion boron nitride (E-BN) was found in the process of depositing cubic boron nitride (cBN) thin film by Plasma Enhanced Pulsed Laser Deposition (PEPLD) method at room temperature.The E-BN thin film was identified using SEM,FTIR and X-ray diffraction techniques.The thermodynamic parameters and time parameter for preparing high-quality E-BN thin film were obtained. This has supported the existing formation theory of the structure of E-BN.