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Cleaning and Passivation of the Temperature Remote Hydrogen Epitaxy Si(lO0) Surface by Low Plasma Treatment for Si
Cleaning and Passivation of the Temperature Remote Hydrogen Epitaxy Si(lO0) Surface by Low Plasma Treatment for Si
1991
T. Hsu
B. Anthony
R. Qian
J. Irby
Sanjay K. Banerjee
Al F. Tasch
S. Lin
H. Marcus
Charles W. Magee
Keywords:
Analytical chemistry
Chemistry
Auger electron spectroscopy
Plasma processing
Surface reconstruction
Passivation
Transmission electron microscopy
Epitaxy
Hydrogen
Reflection high-energy electron diffraction
Correction
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