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Selective Etching by Tailored RF Ion Energy Control Using Frequency/Phase Locked RF Power Delivery
Selective Etching by Tailored RF Ion Energy Control Using Frequency/Phase Locked RF Power Delivery
2017
Yusuke Yoshida
David J. Coumou
Scott White
Steven Shannon
Sergey Voronin
Alok Ranjan
Keywords:
RF power amplifier
Ion
Materials science
Electronic engineering
Optoelectronics
Etching
ion energy
Correction
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