Effect of Ni Ions Irradiation on GaAs pHEMT Materials and Devices

GaAs/AlGaAs heterostructure based pHEMT material and fabricated pHEMT devices characteristics were studied with Ni ions irradiation at different fluences. The structural, electrical and optical characteristics were compared before and after irradiation. The structural property of the material was found unchanged while optical and electrical deterioration was observed for used fluences.