Simulation of Thermal Stress in AlN Thin Film

The thermal stress of the AlN film was simulated by using ANSYS software in this paper,and it's rationality was validated by theoretical calculation.The stress value and distribution of films was simulated.The influence of the film deposition temperature and film thickness on the stress of the film were analyzed.From the simulation results it could be seen that the X direction stress of film surface was concentred in the film center,the edge stress was smaller,but the edge of the deformation was relatively large.The film thermal stress intensified with the deposition temperature rising,but decreased with the film thickness increasing.