High-throughput additive manufacturing of thiol-based, oxygen-insensitive photoresins with digital micromirror devices (Conference Presentation)

We are developing photopolymer resins with a toughness exceeding 25 MJ/m3, with a strain capacity of >200%, which are low odor, and which can be additively manufactured into a mesh of effective density 1,000 different mirrors. Different resins have been tailored with different additive cocktails for rapid manufacturing at different wavelengths ranging from 355 nm to 385 nm to 405 nm.