Method for preparing pixel structure

The invention provides a method for manufacturing a pixel structure. The method comprises the following steps: firstly, a grid and a grid insulation layer covering the grid are formed on a base plate. Then a semiconductor layer, a conducting layer and a photosensitive black matrix of a color filtering layer holding opening are formed on the grid insulation layer in sequence; the photosensitive black matrix comprises a first block and a second block, wherein, the thickness of the first block is smaller than that of the second block. The photosensitive black matrix is taken as a photographic mask, and a channel layer, a source electrode and a drain electrode are formed on the grid insulation layer on the grid simultaneously. A protection layer is formed on a mask layer; a color filtering layer is formed in the color filtering layer holding opening by an ink-jet printing process, and a dielectric layer is formed; in addition, the dielectric layer and the protection layer are patterned to expose the drain electrode. Then a pixel electrode electrically connected with the drain electrode is formed.