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Comparison of Nanosecond 248 nm and Picosecond 355 nm Laser Processes for Selective Ablation of SiNx Material
Comparison of Nanosecond 248 nm and Picosecond 355 nm Laser Processes for Selective Ablation of SiNx Material
2010
D. Heslinga
R. Monna
M Pirot
S. Manuel
C. Moorhouse
J. Brune
S. Gall
Keywords:
Silicon nitride
Laser
Nanosecond
Materials science
Analytical chemistry
Ablation
Picosecond
Optoelectronics
X-ray laser
laser processing
selective ablation
Correction
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