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Dry etching characteristics of IIIV semiconductors in microwave BCl 3 discharges
Dry etching characteristics of IIIV semiconductors in microwave BCl 3 discharges
1993
Steve Pearton
W. S. Hobson
C. R. Abernathy
F. Ren
T. R. Fullowan
Alexander Katz
A. P. Perley
Keywords:
Dry etching
Atomic physics
Analytical chemistry
Semiconductor
Electron cyclotron resonance
Microwave
Chemistry
Nuclear magnetic resonance
Correction
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