Directed Self Assembly (DSA) compliant flow with immersion lithography: from material to design and patterning

In this paper, we present a DSA compliant flow for contact/via layers with immersion lithography assuming the grapho-epitaxy process for cylinders’ formation. We demonstrate that the DSA technology enablement needs co-optimization among material, design, and lithography. We show that the number of DSA grouping constructs is countable for the gridded-design architecture. We use Template Error Enhancement Factor (TEEF) to choose DSA material, determine grouping design rules, and select the optimum guiding patterns. Our post-pxOPC imaging data shows that it is promising to achieve 2-mask solution with DSA for the contact/via layer using 193i at 5nm node.