Cleaning method for plasma treatment device

The invention provides a cleaning method for a plasma treatment device. The plasma treatment device comprises a cavity, and a substrate is put in the cavity for a manufacturing procedure. The cleaning method includes the following steps that a, before the manufacturing procedure is performed on the substrate, a polymer layer not containing fluorine is deposited on the surface of the cavity; b, the manufacturing procedure is performed, and then the substrate is moved out of the cavity; c, clean gas is injected into the cavity, and radio frequency energy is connected to generate plasmas to clean the inside of the cavity. Meanwhile, due to the protective function of the polymer layer not containing fluorine, corrosion to a strong assembly in the substrate manufacturing procedure and the cleaning process is greatly reduced, the service life of the strong assembly is greatly prolonged, and cost is reduced.