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Very Smooth SiO 2 /SiC Interface Formed by Supercritical Water Oxidation of Low Temperature
Very Smooth SiO 2 /SiC Interface Formed by Supercritical Water Oxidation of Low Temperature
2009
Takashi Futatsuki
Taro Oe
Hidemitsu Aoki
Naoyoshi Komatsu
Chiharu Kimura
Takashi Sugino
Keywords:
Supercritical water oxidation
Nanotechnology
Inorganic chemistry
Materials science
Chemical engineering
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