Apparatus for reduction of residue buildup of by-product in semiconductor production processing apparatus and method thereof

PURPOSE: To prevent the residue buildup of a by-product material on the inside surface of an apparatus during semiconductor production. CONSTITUTION: The semiconductor production processing apparatus is constituted to have a reaction chamber 11 and a vacuum system 12 for discharging the gas in the reaction chamber 11. The inside surfaces of the reaction chamber 11 and the vacuum system 12 are at least partly coated 12 with a polymer material and the coefft. of sticking of the coating 21 is ≤10 -4 . The vapor partial pressure of the coating 21 is preferably ≤1% of the total pressure of the chamber 11. COPYRIGHT: (C)1995,JPO