Mainstreaming of the SOI technology

G. Shahidi,A. Ajmera,Fariborz Assaderaghi,R. Bolam,Andres Bryant,M. Coffey,Harold J. Hovel,Jerome B. Lasky,Effendi Leobandung,H.-S. Lo,M. Maloney,Dan Moy,Werner Rausch,D.K. Sadana,Dominic J. Schepis,M. Sherony,Jeffrey W. Sleight,L. Wagner,Kun Wu,B. Davari,Tze-Chiang Chen

Mainstreaming of the SOI technology

1999

Partially-depleted deep sub-micron CMOS on SOI technology is becoming a mainstream technology. This technology offers 20-35% performance gain over a bulk technology implemented with the same lithography. In this paper, the challenges of mainstreaming the SOI technology in device, material, technology and circuit terms are described.

Keywords:

Computer engineering
Electronic engineering
CMOS
Digital electronics
Materials science
Integrated circuit design
Silicon on insulator
Lithography
Mainstreaming
Process design
Electrical engineering
cmos process

Correction
Source
Cite
Save
Machine Reading By IdeaReader

References

Citations