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On The Development of a Reliable Gate Stack for Future Technology Nodes Based on III-V Materials
On The Development of a Reliable Gate Stack for Future Technology Nodes Based on III-V Materials
2018
Abhitosh Vais
Sonja Sioncke
Jacopo Franco
V. Putcha
Laura Nyns
Arturo Sibaja-Hernandez
Rita Rooyackers
Sergio Calderon Ardila
Valentina Spampinato
Alexis Franquet
Jan Maes
Qi Xie
Michael Givens
Fu Tang
Xiang Jiang
Marc Heyns
Dimitri Linten
Jerome Mitard
Aaron Thean
D. Mocuta
Nadine Collaert
Keywords:
gate stack
Electrical engineering
Materials science
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