New Medium Current Ion Implanter SOPHI‐200

The new medium current ion implanter SOPHI‐200 has been developed. By newly designed low aberration optics, high performances have been obtained at a compact implanter system with light tuning. ULVAC’s wafer handling system, which is production proved, has realized the direct implantation to the ultra thin wafer for power device manufacturing. Overview of the system and the performance characteristics will be discussed.