Etching and annealing characteristics of different CR-39 track detectors: A comparative study

Abstract A comparative study of etching response of CR-39 (DOP) with dopant concentration 1% by weight and CR-39 (no additive) detectors for alpha particles indicates that, contrary to the findings of some earlier workers, doped CR-39 detectors are more sensitive than CR-39 (no additive). A possible explanation to interpret these apparently contradictory results has been attempted. The increase in bulk etch rate with annealing has been found to be more for CR-39 (no additive) than CR-39 doped. The annealing (pre- and post-irradiation), on the other hand, causes a decrease in sensitivity of both types of detectors.