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HF-H2O2-H2O- Mixtures for Cleaning sg-Silicon: Removal of Metal Contaminations and Formation of Porous Silicon
HF-H2O2-H2O- Mixtures for Cleaning sg-Silicon: Removal of Metal Contaminations and Formation of Porous Silicon
2012
Edwin Kroke
T Bachmann
I. Röver
Marcus Lippold
Christoph Gondek
Keywords:
Porous silicon
Impurity
Inorganic chemistry
Silicon
Metal
Materials science
Etching
Correction
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