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Effect of Rapid Thermal N2O Annealing on the Dielectric Properties of LPCVD Ta2O5 Films
Effect of Rapid Thermal N2O Annealing on the Dielectric Properties of LPCVD Ta2O5 Films
1994
Shichang Sun
Taifeng Chen
Keywords:
Dielectric
Electronic engineering
Thin film
Leakage (electronics)
Chemical vapor deposition
Nitrogen
Materials science
Annealing (metallurgy)
Electric field
Composite material
Combustion chemical vapor deposition
Ceramic materials
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