Dual-purpose copy arrangement for ultraviolet lighting micro-nano graph air pressure stamping and photolithography

This invention relates to one ultraviolet nanometer gas pressure and etching copy device, which comprises the following parts: host large baseboard, pressure mobile bench system, even light system, pressure mode rack, mode and base slice and calibration system, lift system, load adjust bench system, prism lens and control system, wherein the host baseboard is fixed with pressure mode mobile bench system and other load adjust bench system; the XY pressure mode mobile bench is supported with pressure rack and prism lens added with pressure mask or mask film; the base slice or silicon slice are added onto adjust platform on pressure mode; the calibration system is connected to the one side of light system; the work bench system and light system output signals are output to control system.